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About
Eucerin’s Advanced Spectral Technology offers very high factor UVA/UVB protection and HEVIS light defense. The sunscreen also supports skin’s own DNA repair mechanism.
NART: 63842-09924-22Read more about our product
A facial sunscreen to protect and soothe sensitive and dry skin
UV light is the main cause of sun-induced skin damage, but high-energy visible (HEVIS) light can also induce free radicals that cause further stress to skin. EUCERIN® Sun Face Sensitive Protect Cream SPF 50+ is an everyday facial sunscreen that protects and soothes sensitive and dry skin.
The Advanced Spectral Technology combines broadband and photostable UVA and UVB filters1 for very high UV protection with Licochalcone A to neutralize free radicals caused by UV and HEVIS light.
The sunscreen for sensitive facial skin also includes Glycyrrhetinic Acid which supports skin’s own DNA repair mechanism.
Unperfumed − and with a light, creamy texture −EUCERIN Sun Face Sensitive Protect Cream SPF 50+ is clinically and dermatologically proven to be suitable for sensitive, even atopic skin.
(1) Meeting the high standards for UVA and UVB protection defined by Cosmetics Europe. The levels of UVA protection are higher than the EU recommendation.
Clinical Formula
Licochalcone A
Licochalcone A is a powerful antioxidant, anti-inflammatory and skin-soothing ingredient. It is derived from the root of the Chinese Licorice plant (Glycyrrhiza Inflata) which uses natural compounds to protect its cells from excessive sunlight. When used in skincare products, Licochalcone A works to reduce inflammation and neutralize free radicals that negatively influence skin cells and accelerate the aging process. It helps to protect the deeper epidermal skin layers from sun-induced effects.
Learn MoreGlycyrrhetinic Acid
Glycyrrhetinic Acid is derived from the roots of the Chinese Licorice plant − Glycyrrhiza Glabra − and is known for its antioxidant and skin-soothing properties. It helps to protect the skin cells in the deeper epidermal layers from harmful UV-induced free radicals and supports skin´s own DNA repair mechanism.
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